EV Group (EVG)

DI Erich Thallner Str 1
St Florian am Inn, UA 4782
Austria
43-771-253-110
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More Info on EV Group (EVG)

EV Group (EVG) targets the global semiconductor, MEMS and nanotechnology markets with its industry-leading wafer-bonding, lithography/nanoimprint lithography (NIL), metrology, photoresist coating, cleaning and inspection equipment. www.EVGroup.com

Press Releases

The EVG®6200 NT mask alignment system with UV nanoimprint capability featuring EVG’s proprietary SmartNIL® technology in the cleanroom. Source: EV Group.
New EVG®6200 NT platform enables high-resolution, scalable fabrication of next-generation micro- and nanostructures WARSAW, Poland and ST. FLORIAN, Austria, April 21, 2026...

Articles

FIGURE 1. The next generation of AR devices will display a FOV large enough to layer useful information over a significant expanse of natural human vision, while remaining lightweight and allowing the user to focus comfortably on both the information and the view.
High-index glass wafers are the basis of flexible waveguide designs that bring a new generation of full-immersion augmented reality eyewear closer to fruition.
EVG
Introduced at SPIE's Photonics West 2020, the arrays of waveguide optics on high-index glass have wide field of view, aim for mass-production quantities.
EV Group
The 200 mm wafers are contrasted in size with the new 300 mm wafers produced using nanoimprint lithography (NIL) to support glass technologies for augmented reality/mixed reality (AR/MR).
The work will take place at EVG’s NILPhotonics Competence Center, an open innovation incubator for nanoimprint lithography (NIL).
(Courtesy WaveOptics)
AR wearables such as smart glasses enable users to see digital images overlaid on top of the real world. WaveOptics' waveguide technology transfers light waves from the light source and projects them into the user's eye.
Goal is to produce low-cost, high-performance, waveguides for the consumer AR market.
(Image credit: SwissLitho)
Topography image of a nanoimprint stamp of a 3D computer-generated hologram fabricated with the NanoFrazor from SwissLitho. Stamps such as these can be used to replicate 3D structures in high volume using the HERCULES NIL nanoimprint lithography system from EV Group.
The joint solution enables the production of 3D semiconductor wafer structures down to the single-nanometer scale.
(Image credit: Fraunhofer ISE/A. Wekkeli)
A wafer-bonded III-V and silicon multi-junction solar cell with 30.2% efficiency beats theoretical limits.
Fraunhofer ISE and EVG researchers developed a III-V/Si multi-junction solar cell that exceeds theoretical limits.
1401prod Evgroup
The EVG 720 automated UV nanoimprint lithography system provides full-field lithography with an integrated soft stamp/template fabrication capability.

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