EV Group Addresses Critical Manufacturing Challenges for Next-Generation Co-Packaged Optics
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Comprehensive portfolio of wafer bonding and nanoimprint lithography technologies enables customers and partners to develop scalable CPO architectures for AI-driven data centers and HPC applications |
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ST. FLORIAN, Austria, September 1, 2026—EV Group (EVG), a leading provider of innovative process solutions and expertise serving leading-edge and future semiconductor designs and chip integration schemes, today announced that it is actively engaged with customers and partners across the rapidly evolving co-packaged optics (CPO) ecosystem to support the needs of hyperscale data centers, AI infrastructure and high-performance computing (HPC) applications.
Drawing on decades of expertise in advanced packaging, heterogeneous integration and photonics manufacturing, EVG supports multiple stages of the CPO manufacturing value chain—from process development through high-volume manufacturing (HVM). EVG will showcase its latest CPO process advances during the presentation, “Enabling Scalable CPO Architectures Through Nanoimprint Lithography and Direct Bonding,” at the Heterogeneous Integration Global Summit, co-located with SEMICON Taiwan 2026, on Friday, September 4.
Co-Packaged Optics Drives New Manufacturing Requirements Driven by exponential growth in AI workloads and hyperscale data center infrastructure, the semiconductor industry is increasingly adopting CPO architectures to overcome the bandwidth, latency, power efficiency and signal integrity limitations associated with conventional copper interconnects. CPO brings optical I/O closer to compute by combining photonic integrated circuits (PICs), lasers, and optical structures within the same package. Because these components are made from different materials with different physical and manufacturing properties, integrating them at increasingly higher densities requires new manufacturing approaches.
EVG addresses these challenges through its broad portfolio of wafer bonding, nanoimprint lithography and thin-wafer processing technologies, supported by the company’s NILPhotonics® Competence Center and Heterogeneous Integration Competence Center™ (HICC). These facilities enable customers and partners to develop, optimize and validate new product designs and manufacturing processes in a production-relevant environment before transferring them to HVM, helping accelerate time-to-market while reducing implementation risk. |
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