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WARSAW, Poland and ST. FLORIAN, Austria, April 21, 2026—CEZAMAT, a world-class research center for advanced materials and technologies, and EV Group (EVG), a leading provider of innovative process solutions and expertise serving leading-edge and future semiconductor designs and chip integration schemes, today announced that CEZAMAT’s research infrastructure has been enhanced with the installation of a new EVG®6200 NT SmartNIL® UV nanoimprint lithography (UV-NIL) system.
The EVG6200 NT system provides state-of-the-art mask alignment technology combined with industry-leading UV-NIL capability. EVG’s proprietary SmartNIL technology incorporates multi-use soft-stamp processing, enabling unmatched throughput and scalability while supporting the patterning of high-resolution, high-topography structures.
At CEZAMAT laboratories, the EVG6200 NT will be used for the replication and scaling of a wide range of developed micro- and nanostructures. These include diffractive optical elements and various micro-optical components – such as lenses, waveguides and gratings – for use in photonic integrated circuits, detectors and free-space optics.
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