CRAIC microspectrophotometer tests microdisplay colorimetry and light intensity, even for single pixels

April 23, 2010
San Dimas, CA--CRAIC Technologies designed the 20/20 FPD microspectrophotometer for colorimetry and light intensity comparison of microdisplays of all types on the micron scale.

San Dimas, CA--CRAIC Technologies (www.microspectra.com), manufacturer of ultraviolet (UV), visible, and near-infrared (NIR) microscopes and microspectrometers, designed the 20/20 FPD microspectrophotometer for colorimetry and light intensity comparison of microdisplays of all types. Able to measure the spectra on the micron scale, the 20/20 FPD can even map the color and intensity variations within a single pixel, giving manufacturers the ability to optimize their microdisplay manufacturing process.

"Many of our customers want to measure ever smaller features on flat panel displays. With our experience of spectroscopy and imaging on the micron scale, developing the 20/20 FPD was a logical step for CRAIC Technologies" says Paul Martin, president. "The 20/20 FPD allows for colorimetry, spectroscopy and imaging of small scale pixels that are common with high resolution microdisplays. It can also be configured to measure thin film thickness as well as source intensity. It can even image in the UV, visible and NIR regions."

The 20/20 FPD combines advanced microscopy and spectroscopy with sophisticated software to enable the user to measure spectra, colorimetry, light intensity and film thickness by either transmission or reflectance on the micron scale. As the smallest pixels are now on the order of 10 microns across, the 20/20 FPD provides the ability to not only measure the color and intensity of the entire display but also to compare pixel to pixel and even within a pixel. Designed for the production environment, it can incorporate automated measurement capabilities, touch screen controls, easily modified processing recipes and sophisticated data analysis tools. The ability to directly image and analyze components for contaminants with ultraviolet and near IR microscopy can also be added to this instrument.

About the Author

Gail Overton | Senior Editor (2004-2020)

Gail has more than 30 years of engineering, marketing, product management, and editorial experience in the photonics and optical communications industry. Before joining the staff at Laser Focus World in 2004, she held many product management and product marketing roles in the fiber-optics industry, most notably at Hughes (El Segundo, CA), GTE Labs (Waltham, MA), Corning (Corning, NY), Photon Kinetics (Beaverton, OR), and Newport Corporation (Irvine, CA). During her marketing career, Gail published articles in WDM Solutions and Sensors magazine and traveled internationally to conduct product and sales training. Gail received her BS degree in physics, with an emphasis in optics, from San Diego State University in San Diego, CA in May 1986.

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