Low-profile fast rotation stage is designed for semiconductor wafer positioning
The RGA150 low-profile fast rotation stage has been specifically designed for semiconductor wafer positioning applications. With an aperture diameter of 90 mm and a profile of 60 mm, it offers accuracy of ± 0.001° (mapped), bidirectional repetition of ±0.0975 mdeg, minimum incremental motion of 0.01 mdeg, and a maximum speed of 300 rpm.
Newport (MKS Instruments)
Irvine, CA