Kurt J Lesker Company thin-film deposition system has ion-assisted deposition option
The 2017 PVD75 PRO Line thin-film deposition system allows users to choose options such as HiPIMS and pulse DC sputtering, high-temperature heating options up to 1000°C, ion-assisted deposition, zero-footprint clean room installation, a glove box interface, and smart system monitoring and control.
Kurt J Lesker Company
Hastings, East Sussex, England
www.lesker.com