Eulitha (Würenlingen, Switzerland), developer of Phable (photonics enabler) photolithographic technology, has delivered its PhableR 100 system to a China based manufacturer of specialty optical components. The system was delivered and qualified in the final days of 2014. Eulitha will continue to support the production of the customer with specialty photomasks and process support.
Intended for low-cost printing of photonic patterns, the mask-based Phable photolithography technology has unlimited depth of focus and is a simple alternative to nanoimprint lithography for creating large-area periodic structures such as gratings and photonic-crystal structures.
The PhableR 100 system can expose periodic patterns down to feature sizes below 150 nm, which rivals high-end i-line steppers. The focus-free image formed by the system enables uniform printing on nonflat samples often found in photonic and optoelectronic sectors.
"Production of patterned sapphire substrates and light-extraction structures on LEDs remains to be our main focus, but this adoption by an optical manufacturer demonstrates the wide-ranging application field for our novel technology," says Rene Wild, sales director, Eulitha's sales director.
Eulitha AG is a spin-off company of the Paul Scherrer Institute in Würenlingen and, in addition to its exposure tools, supplies wafer-patterning services.