SPIE doles out 2012 Optics and Photonics scholarship awards

July 19, 2012
Bellingham, WA--SPIE has awarded $350,000 in scholarships to 140 individuals based on their potential for long-range contribution to optics and photonics or a related discipline.

Bellingham, WA--SPIE has awarded $350,000 in scholarships to 140 individuals based on their potential for long-range contribution to optics and photonics or a related discipline. Award-winning applicants were evaluated and selected and approved by the SPIE Scholarship Committee.

2012 top scholarship winners include:

The SPIE D.J. Lovell Scholarship, sponsored by SPIE, was awarded to Maria Serkkova, National Research University of ITMO (St. Petersburg, Russia).

Nutan Gautam, University of New Mexico (Albuquerque, NM), was awarded the John Kiel Scholarship. The award was established to honor SPIE founding member John Kiel, in recognition of his long-standing and significant contributions to the society. This scholarship is sponsored by SPIE and is awarded for the student's potential for long-term contribution to the field of optics and optical engineering.

The Laser Technology, Engineering and Applications Scholarship was awarded to Anton Tcypkin, National Research University of ITMO. This scholarship is awarded in recognition of the student's scholarly achievement in Laser Technology, Engineering, or Applications. Funds are provided in part by SPIE.

The Optical Design and Engineering Scholarship was awarded to Cristina Canavesi, University of Rochester (Rochester, NY). The scholarship was established in memory of Bill Price and Warren Smith, both well-respected members of SPIE's technical community, and is awarded to a full-time graduate or undergraduate student in the field of optical design and engineering.

Elizaveta Yankovskaya, National Research University of ITMO, was awarded the BACUS Photomask Scholarship. This scholarship is awarded to an undergraduate or a graduate student in the field of microlithography, with an emphasis on optical tooling and/or semiconductor manufacturing technologies. This scholarship is sponsored by BACUS, SPIE's Photomask International Technical Group.

Other 2012 SPIE scholarship recipients include students in Africa, Asia, South America, Europe, the Middle East, North America, and South Pacific region.

To date, SPIE has distributed over $3.3 million in individual scholarships.

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