Barry Hopkins, CEO of Rave LLC (Delray Beach, FL), was recently awarded the 2009 Bacus Lifetime Achievement Award at the 2009 Photomask Technology symposium, sponsored annually by SPIE (Bellingham, WA) and BACUS, in Monterey, California. BACUS is SPIE's international technical group for photomask technology.
Hopkins helped found RAVE, with the idea of using the Atomic Force Microscope (AFM) technology in a revolutionary new nanomachining approach for repairing extremely small defects on advanced critical level photomasks. The company has become an industry leader in the field of advanced photomask repair.
In 2010 Hopkins will celebrate 47 years in the semiconductor industry with 40 of those years dedicated directly to the photomask industry.
"Those 40 years have been committed to every aspect of the mask making sciences, captive and commercial mask business development and eventually mask equipment technology," the award citation states. "Just when it was needed, Barry's vision and perseverance in the mask repair equipment arena provided a yield improvement pathway and tremendous cost saving advantage to advanced mask makers around the world."
For more information about SPIE Photomask Technology, see spie.org/photomask.xml