EUV light source from Gigaphoton reaches 20 Watt output

Oyama, Japan--Lithography light source manufacturer Gigaphoton has achieved extreme ultraviolet (EUV) light output equivalent to a maximum of 20 W for its laser-produced plasma (LPP) light sources for EUV lithography scanners. This result was obtained by irradiating the tin (Sn) target with a solid-state pre-pulse laser and a CO₂ laser at 100 kHz. An average EUV output of 10 W was confirmed during operation. Gigaphoton says that these results represent a critical milestone for pre-production level output towards the ultimate 250 W output source.

Since 2002, Gigaphoton has introduced several unique technologies including the development of an on-demand tin-droplets generator with droplets measuring less than 20 μm, the combining of short-wavelength solid-state pre-pulse lasers and CO₂ lasers as a main pulse, and the utilization of magnetic fields for debris mitigation.

The latest details of Gigaphoton's LPP light source technology will be presented at the SPIE Advanced Lithography 2013 conference being held in San Jose, CA from February 24-28.

Gigaphoton says its unique LPP light source technology extends the lifetime of droplet generators by using ultrasmall tin droplets on-demand, reducing downtime and cost. In addition, high-EUV output conversion efficiency has been achieved through the optimized combination source. In order to maximize the life of the collector mirror, a superconducting magnet is used to generate a powerful magnetic field that guides the unwanted debris resulting from the thermal expansion of the tin droplets towards the tin catcher for further reduction of cost and downtime.

"The fact that our unique LPP light source technology is now able to achieve the level of EUV output matching that of today's pre-production performance, proves that our vision for high output, low running cost, stable LPP light sources are indeed achievable," said Hitoshi Tomaru, president and CEO of Gigaphoton. “Our efforts will help to bring the industry closer to realizing mass production level EUV lithography scanners. We are making firm progress towards our entry into the EUV light source business--focusing on technology development to accommodate the future industry needs.”

SOURCE: Gigaphoton; www.gigaphoton.com