Film metrology system
The Vanguard SpectraLASER 200 XL system uses lasers at 458, 633, 780, and 905 nm plus a deep-UV reflectometer to measure thickness, refractive index, and other properties of thick and thin transparent films. The system also offers characterization of AR coatings and back AR coatings at the UV-lithography exposure wavelengths of 365, 248, and 193 nm.
Film metrology system
The Vanguard SpectraLASER 200 XL system uses lasers at 458, 633, 780, and 905 nm plus a deep-UV reflectometer to measure thickness, refractive index, and other properties of thick and thin transparent films. The system also offers characterization of AR coatings and back AR coatings at the UV-lithography exposure wavelengths of 365, 248, and 193 nm.
Rudolph Technologies, Flanders, NJ
