Optical Society names as fellows 61 members who have "served with distinction in the advancement of optics"

March 23, 2009
The Optical Society (OSA) has elevated 61 members to the rank of fellow.

The Optical Society (OSA) board of directors has elevated 61 members to the rank of fellow. The distinction honors those nominated by current fellows to the Fellow Members Committee who have, "served with distinction in the advancement of optics." The number of fellows is limited by the bylaws to no more than 10 percent of the total membership; the OSA's newest fellows will be recognized individually at meetings throughout 2009.

"OSA fellows are involved in the most innovative advances in optics and photonics today," said OSA President Thomas Baer. "Now more than ever, the achievements of these leaders in industry, academia, and government are not only benefiting others in the field of photonics, but also broader critical areas like medicine, alternative energy and the environment. On behalf of OSA, I am very pleased to acknowledge their outstanding contributions and honor my OSA colleagues with this well-deserved distinction."

This year's fellows represent the best and brightest in optics and photonics from all over the world with more than half of the chosen fellows hailing from outside of the United States. Fellows are selected on a variety of criteria such as record of significant publications or patents related to optics, service to OSA, achievements in optics, and management ability.

In alphabetical order, the 61 OSA 2009 fellows are:
+ Hans-Albert Bachor, Australian National University, Australia
+ Bill Barnes, University of Exeter, U.K.
+ Stephen Mark Barnett, University of Strathclyde, U.K.
+ Luc Bergé, Commissariat à l'Energie Atomique, France
+ Stephen A. Boppart, University of Illinois at Urbana-Champaign, U.S.A.
+ Samuel Leon Braunstein, University of York, U.K.
+ Mark Luitzen Brongersma, Stanford University, U.S.A.
+ Ann Catrina Bryce, University of Glasgow, U.K.
+ Vladimir Buzek, Slovenska Akademia Vied, Slovakia
+ Rama Chellappa, University of Maryland, U.S.A.
+ Zhigang Chen, San Francisco State University, U.S.A. and Nankai University, China
+ Julian Cheng, University of Texas at Austin, U.S.A.
+ Dipak Chowdhury, Corning Inc., France
+ Mark Cronin-Golomb, Tufts University, U.S.A.
+ Thomas E. Darcie, University of Victoria,Canada
+ Scott A. Diddams, National Institute of Standards and Technology, U.S.A.
+ Christopher R. Doerr, Bell Laboratories, Alcatel-Lucent, U.S.A.
+ Daniel Dolfi, Thales Research and Technology, France
+ Edwin W. Eloranta, University of Wisconsin-Madison, U.S.A.
+ Thomas Elsaesser, Max-Born-Institut, Germany
+ Martin E. Fermann, IMRA America Inc., U.S.A.
+ Joseph A. Izatt, Duke University, U.S.A
+ Ferenc Krausz, Max-Planck-Institut für Quantenoptik, Germany
+ Kazuo Kuroda, University of Tokyo, Japan
+ Falk Lederer, Friedrich-Schiller-Universität Jena, Germany
+ Juerg Leuthold, Universität Karlsruhe, Germany
+ Ming-Jun Li, Corning Inc., U.S.A.
+ Susana Marcos, Consejo Superior de Investigaciones Cientificas, Spain
+ Carmen S. Menoni, Colorado State University, U.S.A.
+ Rick Millane, University of Canterbury, New Zealand
+ Daniel M. Mittleman, Rice University, U.S.A.
+ Martin Moskovits, University of California Santa Barbara, U.S.A.
+ Pantazis Mouroulis, Jet Propulsion Laboratory, U.S.A.
+ Chang Hee Nam, Korea Advanced Institute of Science and Technology, Korea
+ Evgeniy E. Narimanov, Purdue University, U.S.A.
+ Jay Neitz, Medical College of Wisconsin, U.S.A.
+ David Dodge Nelson, Jr., Aerodyne Research, Inc., U.S.A.
+ Miguel Orszag, Pontificia Universidad Catolica de Chile, Chile
+ Tilman Pfau, Universität Stuttgart, Germany
+ Yehiam Prior, Weizmann Institute of Science, Israel
+ John G. Rarity, University of Bristol, U.K.
+ Pascal Salieres, Commissariat à l'Energie Atomique, France
+ Kenneth J. Schafer, Louisiana State University, U.S.A.
+ Lu J. Sham, University of California San Diego, U.S.A.
+ Francesco Simoni, Università Politecnica delle Marche, Italy
+ Henry I. Smith, Massachusetts Institute of Technology, U.S.A.
+ Alexei Vladimirovich Sokolov, Texas A&M University, U.S.A.
+ Aephraim E. Steinberg, University of Toronto, Canada
+ Albert Stolow, National Research Council Canada, Canada
+ Andrei Tokmakoff, Massachusetts Institute of Technology, U.S.A.
+ Stefano Trillo, Università degli Studi di Ferrara, Italy
+ Alfred Vogel, Universität zu Lüebeck, Germany
+ Stefan Wabnitz, Università degli Studi di Brescia, Italy
+ Ping-kong Alexander Wai, Hong Kong Polytechnic University, Hong Kong
+ Edward A. Watson, U.S. Air Force Research Laboratory, Sensors Directorate, U.S.A.
+ Martin Wegener, Universität Karlsruhe, Germany
+ Andrew G. White, University of Queensland, Australia
+ Changde Xie, Shanxi University, China
+ James M. Zavislan, University of Rochester, U.S.A.
+ John J. Zayhowski, MIT Lincoln Lab., U.S.A.
+ Xiang Zhang, University of California Berkeley, U.S.A.

Find out about each fellow's accomplishments—and see photos—on the Awards and Fellows section of OSA's Web site.

The Optical Society (OSA) works to unite the global optics community through its programs and initiatives, and consists of more than 70,000 professional members from 134 countries.

About the Author

Barbara Gefvert | Editor-in-Chief, BioOptics World (2008-2020)

Barbara G. Gefvert has been a science and technology editor and writer since 1987, and served as editor in chief on multiple publications, including Sensors magazine for nearly a decade.

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