Munich, Germany, April 3, 2003. Semiconductor Equipment and Materials International (SEMI) has recognized three industry technologists for their achievements and contributions to the development of global semiconductor industry standards at an awards ceremony held in conjunction with the SEMICON Europa 2003 trade fair.
The International Collaboration Award, which recognizes individuals who have provided outstanding contributions in the area of international cooperation within the SEMI Standards program, was presented to Rik Jonckheere, IMEC. Jonckheere is recognized for his leadership of the "Definitions of Specifications (Terminology) for Photomask Fabrication and Qualification" task force. During his tenure, Jonckheere has excelled in recruiting participants for his task force, actively involving more than 20 companies.
The Leadership Award, given in recognition of outstanding leadership in guiding the SEMI Standards program and for active participation in committees and task forces in the development of SEMI Standards, was awarded to Wolfgang Jantz, Fraunhofer Institute for Applied Solid State Physics. A participant in several SEMI Standards committees and task forces, Jantz has excelled in leading the revival and growth of the European SEMI Standards Compound Semiconductor Materials Technical Committee and, in particular, the European 150-mm Gallium Arsenide Task Force. Through his contributions to SEMI Standards, Jantz has greatly aided international collaboration with the United States and Japan in the compound semiconductor area.
The Merit Award, which honors volunteers who have made major contributions to the semiconductor industry through the SEMI Standards program, was presented to Gerd Limmer, Siemens. Limmer led program efforts to update and extend the SEMI S2 guidelines for semiconductor manufacturing safety, including new provisions for software-controlled emergency-stop systems and the use of bus-based safety technology. Under Limmer's leadership, this complex project, which was initiated in Europe and approved in March 2003, took less than two years to complete.
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