Chemically flexible precursors allow low-temperature silicon-nitride deposition process

Jan. 1, 1998
Alain Kaloyeros and colleagues at the Center for Advanced Thin Film Technology at the University at Albany--State University of New York (Albany, NY) deposited silicon nitride (SiN) films by a cost-effective, low-temperature thermal-atmospheric-pressure-chemical-vapor-deposition--AP-CVD--method.

Alain Kaloyeros and colleagues at the Center for Advanced Thin Film Technology at the University at Albany--State University of New York (Albany, NY) deposited silicon nitride (SiN) films by a cost-effective, low-temperature thermal-atmospheric-pressure-chemical-vapor-depositionAP-CVDmethod. The researchers used a novel group of precursors to deposit the SiN at temperatures below 450°C. At the Materials Research Society meeting (Boston, MA) last December, Kaloyeros said that current thermally based deposition technologies for silicon-based compounds often require prohibitively high processing temperaturestypically more than 700°C. And although plasma-based deposition techniques allow lower process temperaturesless than 450°Cthe risk of damage and contamination is higher. And developing technologies in optoelectronics and flat-panel displays will require even lower temperatures.

The AP-CVD method is unique because it takes advantage of the low dissociation energy of the primary bonds in the source precursors. These precursors are chemically flexible, which means that silicon, silicon nitride, or silicon dioxide can be deposited depending on whether hydrogen, oxygen, or ammonia is used as the reactant. Kaloyeros says that the potentially low cost of ownership of an AP-CVD system is a key consideration and that the technology can be extended to low-pressure chemical-vapor-deposition cluster tools.

Sponsored Recommendations

Brain Computer Interface (BCI) electrode manufacturing

Jan. 31, 2025
Learn how an industry-leading Brain Computer Interface Electrode (BCI) manufacturer used precision laser micromachining to produce high-density neural microelectrode arrays.

Electro-Optic Sensor and System Performance Verification with Motion Systems

Jan. 31, 2025
To learn how to use motion control equipment for electro-optic sensor testing, click here to read our whitepaper!

How nanopositioning helped achieve fusion ignition

Jan. 31, 2025
In December 2022, the Lawrence Livermore National Laboratory's National Ignition Facility (NIF) achieved fusion ignition. Learn how Aerotech nanopositioning contributed to this...

Nanometer Scale Industrial Automation for Optical Device Manufacturing

Jan. 31, 2025
In optical device manufacturing, choosing automation technologies at the R&D level that are also suitable for production environments is critical to bringing new devices to market...

Voice your opinion!

To join the conversation, and become an exclusive member of Laser Focus World, create an account today!