Synopsys and Photronics collaborate to improve processes

Mountain View, CA, and Brookfield, CT, Sept. 15, 2004--Synopsys and Photronics have announced a joint program focused on improving the manufacturability and quality of advanced photomasks and reducing the cycle times for design-to-photomask flows. Synopsys and Photronics will jointly explore and develop solutions in the area of design for manufacturing (DFM) and mask synthesis targeting faster time to yield for semiconductor manufacturers.

Specific activities in the collaboration will include efforts to improve the design flow from layout to mask for alternating aperture phase shift masks (AAPSM), to improve the yield and cycle time for masks using strong resolution enhancement techniques (RET), and to reduce the turn around time for mask inspection using Synopsys' suite of DFM software tools.

"Synopsys looks forward to advancing its relationship with Photronics to jointly address the escalating complexity of photomask fabrication," said Dan Page, vice president of engineering at Synopsys. "We expect this will be one of a number of collaborations in which Synopsys will link its comprehensive DFM software solution to technology-leading manufacturers, such as Photronics, to advance the complex technological and business issues of chip manufacturing and ultimately enable our customers to achieve their production and yield goals."