Laserbased xy measurement system promises repeatability of 10 nm

A laserbased interferometric measurement system capable of providing 7nm (3s) criticaldimensionmeasurement repeatability and 10nm (3s) patterncoordinatemeasurement repeatability has been introduced by Nikon Precision Inc. (Belmont, CA). The XY5i will enable makers of complex integrated devices to establish the location of patterns on photomasks and reticles used in production of integrated circuits, thinfilm magnetic heads, and flatpanel displays, according to senior manager of special products

A laserbased interferometric measurement system capable of providing 7nm (3s) criticaldimensionmeasurement repeatability and 10nm (3s) patterncoordinatemeasurement repeatability has been introduced by Nikon Precision Inc. (Belmont, CA). The XY5i will enable makers of complex integrated devices to establish the location of patterns on photomasks and reticles used in production of integrated circuits, thinfilm magnetic heads, and flatpanel displays, according to senior manager of special products David Kettering, who says this critical dimensionmeasurement repeatability is three or four times better than is currently available.

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