MKS Announces Two Capacitance Manometers for 300mm Processes

Dec. 17, 2001
MKS Instruments, a manufacturer of components and subsystems for vacuum- and gas-based processes, has announced two new process-specific Baratron capacitance manometers. The new manometers are specifically designed for high stability pressure measurement in PVD and dielectric etch semiconductor processes

MKS Instruments, Inc., a manufacturer of components and subsystems for vacuum- and gas-based processes, has announced two new process-specific Baratron capacitance manometers. The new manometers are specifically designed for high stability pressure measurement in PVD (physical vapor deposition) and dielectric etch semiconductor processes. The new Baratron manometers feature fast 15-minute warm-up that increases tool utilization, a unique design to minimize process-related drift, and fulfill the price and performance requirements of new 300mm as well as current 200mm process tools.

"These two new products are the latest in MKS' portfolio of application-specific Baratron manometers that have been developed to meet specific requirements of advanced dielectric etch, including low-k etch, and PVD processes on new generation 300mm platforms and existing 200mm platforms at a cost-effective price," says Bob Hyman, Product Manager for MKS Instruments Pressure Products group. "They are both based on proven MKS Baratron manometer technology with design refinements to meet the challenges of these etch processes, as well as advanced PVD processes."

The Baratron PVD Manometer has a full scale range of 100 mTorr, which gives high resolution at the low mTorr ranges required by the most advanced sputter deposition processes. The Baratron Dielectric Etch Manometer has a full scale range of 1 Torr and covers the pressure range required by both high-density and low-density plasma etch processes.

Both manometers have structures in the sensor housing that prevent process by-products from depositing on the surface of the sensing diaphragm, which minimizes drift associated with these harsh processes and improves long-term stability. The sensors operate at ambient temperatures from 15�C to 40�C and are accurate to 0.25% of Reading, including non-linearity, hysteresis, and non-repeatability. The resolution is 0.001% of Full Scale. All surfaces exposed to the process gases are corrosion-resistant Inconel. The manometers can be used with MKS power supplies, display units, and pressure controllers, or any compatible control and readout instruments.

The two new Baratron capacitance manometers are the latest in a series of process-specific manometers, initiated with the MKS E28 Baratron Etch Manometer. The new Baratron manometers minimize drift by preventing deposits and particulates from reaching the diaphragm. A unique patented deposition baffle and particle trap are integrated into the lower vacuum housing. This protects the sensor diaphragm from deposits while allowing gas molecules to reach the diaphragm for accurate pressure measurement, without compromising the typical 30 millisecond-response time to pressure changes.

For more information, go to www.mksinst.com.

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