Rotary stage

    March 1, 1998
    A low-profile rotary stage is designed for use in 300-mm wafer-handling operations. The PLR-300 stage has a height of 32 mm and is powered by two diagonally opposed piezoceramic linear motors. A linear/rotary encoder provides positioning precision. The motor does not generate heat during operation, and the rotary stage is both nonmagnetic and cleanroom- and vacuum-compatible.

    Rotary stage

    A low-profile rotary stage is designed for use in 300-mm wafer-handling operations. The PLR-300 stage has a height of 32 mm and is powered by two diagonally opposed piezoceramic linear motors. A linear/rotary encoder provides positioning precision. The motor does not generate heat during operation, and the rotary stage is both nonmagnetic and cleanroom- and vacuum-compatible.

    Anorad Corp., Hauppauge, NY

    For FREE Data Circle 419

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