Consultation Work with our team to determine which products or systems are the best fit for your application. A case study examining display production that optimizes quality and throughput – and lower total cost. Date: 3/15/2026 - 3/19/2026 How precision motion systems enable cutting-edge applications like wafer inspection, scanning white light interferometry (SWLI), electron/ion beam microscopy (SEM/FIB), atomic force microscopy (AFM) and reticle/mask inspection; How on-axis and off-axis error motions affect metrology applications, plus techniques for compensating for those errors; How system-level optimization, consideration of environmental factors and the application of advanced controls techniques are crucial for achieving nanometer-level precision and maximizing throughput; How industry-leading solutions are pushing the boundaries of what’s possible in semiconductor metrology.