December 20, 2006, San Diego, CA--Cymer and Nikon (Tokyo, Japan) celebrated today the 1,000th laser light source shipment and the companies' 20-year partnership. The milestone shipment--an XLA 300 laser light source--will be integrated on a S610C lithography scanner, which will be used, by Nikon, in immersion lithography production to image next-generation integrated circuits.
"We are grateful to Nikon for its acceptance of this 1,000th shipment, which is a testament of our successful long-term partnership," said Ed Brown, Cymer president and CEO. "As the industry continues to grow, we will continue our ongoing efforts to provide the best, leading excimer laser light sources for deep ultraviolet (DUV) lithography, to support high-quality chip production."
Cymer and Nikon will host a joint celebratory event today in Kumagaya, Japan, to commemorate this 1,000th shipment milestone and recognize the valued longstanding relationship between the two companies.
"For many years Cymer has met and exceeded our expectations with their best-in-class, cutting-edge excimer light source technology," said Kazuo Ushida, Nikon president. "With this 1,000th shipment, we recognize our long-standing partnership with Cymer, and look forward to continuing our collaboration to support next-generation technology integration in the years to come."
For more information, contact Cymer.
