DSI to showcase new photolithography patterning capacity at SPIE Optics + Photonics 2014

Aug. 8, 2014
Thin-film optical coatings maker Deposition Sciences, Inc. (DSI) is offering an enhanced capability to manufacture patterned optical filters, having increased its capacity and resolution by introducing a photolithography production line capable of patterning 200-mm-diameter wafers.

Thin-film optical coatings maker Deposition Sciences, Inc. (DSI) is offering an enhanced capability to manufacture patterned optical filters, having increased its capacity and resolution by introducing a photolithography production line capable of patterning 200-mm-diameter wafers. The capability provides an enhanced view or enhanced detection in multispectral imaging tasks by fusing together information from different wavelength bands. Other applications include satellite imaging, UAV overhead reconnaissance, machine vision, food and industrial inspection, automotive, biomedical sensing, color filter arrays for CCD and CMOS cameras, and reticles, among others.

SPIE Optics + Photonics booth number: 439

To Learn More:

Contact:Deposition Sciences, Inc. (DSI)
Headquarters: Santa Rosa, CA
Product: Photolithography patterning capacity
Key Features: Capable of patterning 200-mm-diameter wafers

What DSI says:
View more information on the company's photolithography patterning capacity.

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