SPIE honors optical lithography pioneers at Advanced Lithography meeting

February 26, 2008, San Jose, CA--Eight new SPIE Fellows and winners of several important awards were announced yesterday at the 33rd annual SPIE Advanced Lithography symposium.

February 26, 2008, San Jose, CA--Eight new SPIE Fellows and winners of several important awards were announced yesterday at the 33rd annual SPIE Advanced Lithography symposium.

Martin van den Brink of ASML Netherlands received the 2008 Frits Zernike in recognition of his pioneering contributions to the advancement of optical lithographic exposure tools. SPIE confers the Frits Zernike Award annually to honor outstanding accomplishments in microlithography, especially those furthering the development of semiconductor lithographic imaging solutions. The award is sponsored by Cymer and ASML.

The eight new Fellows named yesterday are among a total of 72 new SPIE Fellows promoted this year and being announced in presentations at various SPIE events. The new promotions bring the total of SPIE Fellows from the Advanced Lithography community to 29, and include:

--Christopher P. Ausschnitt, IBM Microelectronics Division
--Peter De Groot, Zygo Corporation
--Elizabeth Dobisz, Hitachi Global Storage Technologies
--Mircea Dusa, ASML U.S. Inc.
--Winfried Kaiser, Carl Zeiss SMT AG
--Shinji Okazaki, Hitachi Ltd.
--Richard Silver, National Institute of Standards and Technology (NIST)
--David Williamson, Nikon Research Corporation of America.

Fellows are members of distinction who have made significant scientific and technical contributions in the multidisciplinary fields of optics, photonics, and imaging. They are honored for their technical achievement, for their service to the general optics community, and to SPIE in particular.

The 2007 C. Grant Willson Best Paper Award was presented to a team of authors from IBM Almaden Research Center and IBM Semiconductor Research and Development Center for a paper on "Fluoro-alcohol materials with tailored interfacial properties for immersion lithography." Authors included Daniel Sanders, Linda Sundberg, Ratnam Sooriyakumaran, Philip Brock, Richard DiPietro, Hoa Truong, Dolores Miller, Margaret Lawson, and Robert Allen. The award was sponsored by AZ Electronic Materials, and presented by Conference Chair Clifford Henderson, Georgia Institute of Technology.

Authors Matthew Sendelbach and Javier Ayala, IBM Microelectronics Division, and Pedro Herrera, KLA Tencor, were awarded the 2007 Metrology, Inspection, and Process Control Best Paper Award by Conference Chair John A. Allgair, SEMATECH, Inc., and Advanced Microdevices, and Co-Chair Christopher J. Raymond, Nanometrics, Inc. The paper was titled, "Predicting electrical measurements by applying scatterometry to complex spacer structures."

The 2008 Symposium Chair, Roxann Engelstad of the University of Wisconsin, Madison, was given a Certificate of Appreciation for her years of leadership of the symposium. Symposium Co-Chair Christopher Progler of Photonics, Inc., made the presentation on behalf of SPIE.

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