Photronics Introduces Phase Masks For Optical Components

Nov. 21, 2001
Photronics has introduced a new phase mask technology for the passive optical components industry. Phase masks, which are used in the manufacture of Fiber Bragg Gratings, are a critical component for controlling wavelength selectivity and dispersion compensation in high performance optical networks

Photronics, a reticle technology and service supplier to the semiconductor industry, has introduced a new proprietary phase mask technology for the passive optical components industry. Phase masks, which are used in the manufacture of Fiber Bragg Gratings (FBG's), are a critical component for controlling wavelength selectivity and dispersion compensation in high performance optical networks. In support of semiconductor companies and their sub-wavelength lithography requirements, Photronics has developed a unique electron beam (e-beam) patterning and quartz etching capability. After close collaboration with optical component manufacturers and careful study of their requirements, the Company adapted its e-beam patterning and quartz etching skill sets to take a technology leadership position in the phase mask market. Photronics' e-beam phase masks are now being used by a select and growing group of customers all around the world.

"FBG phase masks are a natural extension of our semiconductor technology into a field where innovation is rapidly embraced," commented Steve Carlson, Senior Vice President- Technology for Photronics. "We believe our new proprietary product will enable passive all-fiber solutions for many of the multi-channel optical network challenges." Researchers have long sought ways to implement electron beam approaches in fabricating phase masks in order to overcome the inherent design limitations of the interference lithography process, which is currently the standard today in the FBG industry. "Until now, electron beam phase masks were characterized by stitching errors that have relegated them to a limited application space in the FBG market. Our patent pending process technology has reduced stitching errors to the point where they blend into the reflection spectra background noise," added Carlson.

Francois Bilodeau, Vice President of Research and Development at Alcatel Optronics Canada in Gatineau, Quebec commented, "We are excited that Photronics has overcome previous limitations associated with electron beam phase masks. Their e-beam phase masks enable more exotic FBG's in a mass production environment, which in turn helps us to create new opportunities for our customers. We welcome Photronics' creativity and innovation into the phase mask supply chain."

Constantine "Deno" Macricostas, Chairman and CEO of Photronics noted, "Photronics is forever striving to identify ways to bring our innovative technology, service and global manufacturing infrastructure to new markets. It is by adding value through this phase mask product, the core of which is derived from our unique understanding of the semiconductor industry's requirement for advanced phase shift technology and service, that has enabled us to succeed in entering the very large optical component industry."

Additional information on the company can be accessed at www.photronics.com.

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