Kurt J Lesker Company thin-film deposition system has ion-assisted deposition option

The 2017 PVD75 PRO Line thin-film deposition system allows users to choose several options.

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The 2017 PVD75 PRO Line thin-film deposition system allows users to choose options such as HiPIMS and pulse DC sputtering, high-temperature heating options up to 1000°C, ion-assisted deposition, zero-footprint clean room installation, a glove box interface, and smart system monitoring and control.
Kurt J Lesker Company
Hastings, East Sussex, England

www.lesker.com

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