Cymer to debut XLA 300 light source at Semicon West

July 6, 2005, San Diego, CA--Cymer plans to unveil the XLA 300 -- a 193nm, 6 kilohertz (kHz), argon fluoride (ArF) light source to enable volume production for 45-nm immersion photolithography applications, at SEMICON West in San Francisco, next week.

This fourth generation light source on Cymer's MOPA platform allows chipmakers to take advantage of the 6-kHz repetition rate and up to 90 watts (W) of output power -- offering an adaptable solution supporting the next-generation requirements of the ArF immersion lithography market.

"With over 200 XL Series light sources shipped to date, the XLA 300 combines an industry-proven platform with configurable power -- resulting in an advanced light source ready to meet the semiconductor industry's evolving immersion lithography needs," said Cymer Chairman and CEO, Bob Akins.

Cymer debuts the XLA 300 five months after announcing the initial shipment of its XLA 200. Deliveries of the XLA 300 will begin in the fourth quarter of 2005.