Plasma source
The APS plasma source is designed for use in thin-film filter deposition systems. The device includes a long-lived cathode source that permits plasma-assisted deposition of optical coatings that involve multiple layers, different materials, and different process steps. This sort of deposition can be used to create hard, dense, nonshifting optical filters. A secondary ring coil provides full coverage over the substrate holder to ensure uniform coatings.
Plasma source
The APS plasma source is designed for use in thin-film filter deposition systems. The device includes a long-lived cathode source that permits plasma-assisted deposition of optical coatings that involve multiple layers, different materials, and different process steps. This sort of deposition can be used to create hard, dense, nonshifting optical filters. A secondary ring coil provides full coverage over the substrate holder to ensure uniform coatings.
Leybold Technologies, Enfield, CT
