Plasma source

June 1, 1997
The APS plasma source is designed for use in thin-film filter deposition systems. The device includes a long-lived cathode source that permits plasma-assisted deposition of optical coatings that involve multiple layers, different materials, and different process steps. This sort of deposition can be used to create hard, dense, nonshifting optical filters. A secondary ring coil provides full coverage over the substrate holder to ensure uniform coatings.

Plasma source

The APS plasma source is designed for use in thin-film filter deposition systems. The device includes a long-lived cathode source that permits plasma-assisted deposition of optical coatings that involve multiple layers, different materials, and different process steps. This sort of deposition can be used to create hard, dense, nonshifting optical filters. A secondary ring coil provides full coverage over the substrate holder to ensure uniform coatings.

Leybold Technologies, Enfield, CT

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