Ellipsometer

Sept. 1, 1997
The CER Ellipsometer SE 500 combines single-wavelength ellipsometry and normal-incidence reflection spectroscopy to measure thin films. This technique overcomes the ambiguity in film thickness that can occur using only single-wavelength ellipsometry. The instrument records both a reflection spectrum and the ellipsometric angles of a spot under test, which allows the refractive index and film thickness to be calculated. The system can be used with a fully automatic wafer-handling system for fast

Ellipsometer

The CER Ellipsometer SE 500 combines single-wavelength ellipsometry and normal-incidence reflection spectroscopy to measure thin films. This technique overcomes the ambiguity in film thickness that can occur using only single-wavelength ellipsometry. The instrument records both a reflection spectrum and the ellipsometric angles of a spot under test, which allows the refractive index and film thickness to be calculated. The system can be used with a fully automatic wafer-handling system for fast wafer mapping.

Sentech Instruments GmbH, Berlin, Germany

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