Taking chip-making into the next millennium

Jan. 1, 1999
Put the world`s leading chipmakers in a room to discuss the future of lithography in the semiconductor business and you won`t find a more excited bunch or a topic more hotly debated. This is what you will see at SPIE`s Microlithography Symposium, to be held March 14-19, 1999, in the Santa Clara Convention Center, Santa Clara, CA.

Taking chip-making into the next millennium

Patrick Dougherty

Put the world`s leading chipmakers in a room to discuss the future of lithography in the semiconductor business and you won`t find a more excited bunch or a topic more hotly debated. This is what you will see at SPIE`s Microlithography Symposium, to be held March 14-19, 1999, in the Santa Clara Convention Center, Santa Clara, CA.

In 1999, the symposium will continue its tradition of presenting the latest research on state-of-the-art optical lithography techniques, issues to be faced as we extend those techniques, and issues raised by alternative technologies. This variety is increasingly important as optical lithography, historically the dominant patterning technology, becomes more difficult to apply to leading-edge IC fabrication. Long regarded as a solid users` meeting, this symposium is the forum in which the optical extension "tricks" and the alternative technologies must be supported with real data and applications.

As semiconductor roadmaps continue to aggressively shrink design rules, the cost of lithography equipment and processes to meet these demands continues to increase. At the same time, there are serious questions related to technology selection for future fabs. This year`s symposium will open with two plenary speakers presenting different perspectives on equipment selection for production.

Microlithography features 470 papers covering a wide range of topics.

Emerging Lithographic Technologies

One of the six grand challenges on the 1997 National Technology Roadmap for Semiconductors is to obtain higher resolution and affordable lithography at and below 130 nm. This conference covers lithographic approaches that push beyond the "mainstream" developments in the semiconductor industry.

Metrology, Inspection, and Process Control for Microlithography

This conference encompasses the growing need for state-of-the-art metrology processes for production microlithography. Integrated circuits, microstructures, and flat-panel displays are becoming increasingly reliant on measurement, inspection, and process-control technologies to guide the development of new processes, and to guarantee robust production and high yields into the 21st century.

Resist Technology and Processing

This conference will emphasize the most recent advances of high-performance resist materials in established, maturing, and new lithographic technologies.

Optical Microlithography

This conference features papers that advance the state of the art in production microlithography. New ideas will be offered on extending resolution, minimizing linewidth variation, improving overlay, reducing cost, and increasing productivity. o

For further information

For full lists of paper titles and authors, short courses, and general information about attending the Microlithography Symposium and Exhibition, go to the Web at www.spie.org/info/ml/ or contact SPIE to request an advance technical program; e-mail: [email protected]; tel.: (360) 676-3290; FAX (360) 647-1445.

PATRICK DOUGHERTY is a promotions manager at SPIE--The International Society for Optical Engineering, Bellingham, WA; www.spie.org.

Sponsored Recommendations

Ask the Expert: Building Better Laser Micromachining Systems

Dec. 8, 2023
Dr. Cliff Jolliffe, Head of Strategic Marketing, Industrial Automation, Physik Instrumente (PI), fields questions about integrating controls for different motion systems and lasers...

Video: December 8, 2023 Photonics Hot List

Dec. 8, 2023
In this episode, we cover a microscopy method that hits uncharted cell territory, drone-based imaging for solar farm inspection, soliton microcombs that boost conversion efficiency...

China’s industrial laser market shows steady growth in turbulent times

Dec. 8, 2023
This in-depth market update focuses on trends in laser processing and industrial lasers while touching on what to expect in the ultrafast laser, fiber laser, LiDAR, and handheld...

What does it take to land venture capital for photonics-driven startups?

Dec. 7, 2023
Capital to grow a startup company can come from many sources: contract and non-recurring engineering (NRE) funding, angels and friends, customer upfront payments, and venture ...

Voice your opinion!

To join the conversation, and become an exclusive member of Laser Focus World, create an account today!