Gigaphoton develops high-power CO2-laser-driven EUV light source

Oct. 2, 2013
Oyama, Japan--Gigaphoton has jointly developed a high-power carbon dioxide (CO2) drive laser for extreme ultraviolet (EUV) light sources with Mitsubishi Electric Corporation.

Oyama, Japan--Lithography light source manufacturer Gigaphoton has jointly developed a high-power carbon dioxide (CO2) drive laser for extreme ultraviolet (EUV) light sources with Mitsubishi Electric Corporation (Tokyo, Japan). An average power output level of 15 W was achieved on a development EUV system, representing another step forward in realizing production-level EUV light sources.

The 15 W EUV light output was confirmed on a prototype EUV light source. Furthermore, initial experiments conducted on the jointly developed CO2 drive laser has produced output power of more than 20 kW, signifying, says Gigaphoton, that a key piece of technology necessary for producing EUV output levels of 250 W that are necessary for high-volume manufacturing has been realized.

Gigaphoton has focused on developing high-output, stable, and economical laser-produced plasma (LPP) light sources since 2002.

"I am very pleased that the CO2 driver laser jointly developed with Mitsubishi Electric Corporation has demonstrated sufficient output levels necessary for production and that our unique LPP light source technology is showing firm progress towards high volume production level output," said Hitoshi Tomaru, president and CEO of Gigaphoton. "This also demonstrates progress towards realizing our vision for a Green, environmentally friendly LPP light source. Our efforts will help to bring the industry closer to realizing EUV lithography scanners for high volume manufacturing."

Gigaphoton is striving to offer the most environmentally friendly, cost effective, and powerful EUV light source possible through unique technologies such as double pulse LPP and debris mitigation using superconducting magnets.

Tin (Sn) droplets are irradiated using a high-energy pulse driver laser to create tin plasma that is used to generate the EUV light. Improving the conversion efficiency of the EUV light generation and achieving efficient and effective mitigation of debris from the collector mirror are key issues that must be resolved for production-level EUV light sources.

Highly efficient EUV output is possible, says Gigaphoton, based on the optimized use of a short wavelength solid-state pre-pulse laser in conjunction with a CO2 main pulse laser. Efficient and effective debris mitigation is also possible through Gigaphoton's unique method of utilizing a superconducting magnet to generate a powerful magnetic field that guides the unwanted debris resulting from the thermal expansion of the Tin droplets towards the Tin catcher. This results in further reduction of cost and downtime.

SOURCE: Gigaphoton; http://www.gigaphoton.com/news/%e3%82%ae%e3%82%ac%e3%83%95%e3%82%a9%e3%83%88%e3%83%b3%e3%80%81euv%e9%9c%b2%e5%85%89%e7%94%a8%e5%85%89%e6%ba%90%e5%90%91%e3%81%91%e3%83%89%e3%83%a9%e3%82%a4%e3%83%90%e3%83%bcco2%e3%83%ac%e3%83%bc/?lang=en

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