The PhableR 100 photolithography system is designed for printing high-resolution nanostructures for R&D applications and pilot and low-volume production use. It focuses on production of periodic patterns such as gratings and photonic crystals. It can print linear gratings with a half-pitch of 150 nm with high uniformity, even on nonflat substrates.
Eulitha
Villigen, Switzerland
www.eulitha.com
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