UV excimer laser from Quantel for DUV applications

This 193 nm excimer laser verifies the integrity of critical optics and coatings for deep ultraviolet (UV) applications.
March 15, 2015
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This 193 nm excimer laser, having a wavelength that can rapidly damage optics, verifies the integrity of critical optics and coatings for deep ultraviolet (UV) applications such as semiconductor photolithography, ablation (mass spectrometry), and LASIK laser eye surgery. The laser is located at the company’s laser damage test facility.
Quantel Laser
Bozeman, MT
www.quantel-laser.com

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