Excimer laser stepper

July 1, 1997
A KrF excimer-laser microlithography stepper, the FPA-3000EX4, can process more than 73 wafers in an hour, exposing images with 0.25-µm features with 35-nm stage stepping accuracy. The machine includes a fast linear motor air-guiding tilting stage, off-axis illumination, and an optimized tilt-focusing system that improves edge-shot chi¥yields.

Excimer laser stepper

A KrF excimer-laser microlithography stepper, the FPA-3000EX4, can process more than 73 wafers in an hour, exposing images with 0.25-µm features with 35-nm stage stepping accuracy. The machine includes a fast linear motor air-guiding tilting stage, off-axis illumination, and an optimized tilt-focusing system that improves edge-shot chi¥yields.

Canon USA, Lake Success, NY

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