• Excimer for microlithography

    A 248-nm excimer laser is designed for deep-UV microlithography steppers and scanners using high-numerical-aperture projection lenses. The beam has a narrow linewidth of less than 0.6 pm FWHM, and 95% of the laser energy is contained in a bandwidth of less than 2 pm. The NovaLine LITHO/S incorporates a polarization-coupled resonator design that improves the spectral purity and laser operating efficiency.
    Jan. 1, 1998

    Excimer for microlithography

    A 248-nm excimer laser is designed for deep-UV microlithography steppers and scanners using high-numerical-aperture projection lenses. The beam has a narrow linewidth of less than 0.6 pm FWHM, and 95% of the laser energy is contained in a bandwidth of less than 2 pm. The NovaLine LITHO/S incorporates a polarization-coupled resonator design that improves the spectral purity and laser operating efficiency.

    Lambda Physik, Fort Lauderdale, FL

    Sign up for Laser Focus World Newsletters
    Get the latest news and updates.

    Voice Your Opinion!

    To join the conversation, and become an exclusive member of Laser Focus World, create an account today!