Excimer for microlithography

    Jan. 1, 1998
    A 248-nm excimer laser is designed for deep-UV microlithography steppers and scanners using high-numerical-aperture projection lenses. The beam has a narrow linewidth of less than 0.6 pm FWHM, and 95% of the laser energy is contained in a bandwidth of less than 2 pm. The NovaLine LITHO/S incorporates a polarization-coupled resonator design that improves the spectral purity and laser operating efficiency.

    Excimer for microlithography

    A 248-nm excimer laser is designed for deep-UV microlithography steppers and scanners using high-numerical-aperture projection lenses. The beam has a narrow linewidth of less than 0.6 pm FWHM, and 95% of the laser energy is contained in a bandwidth of less than 2 pm. The NovaLine LITHO/S incorporates a polarization-coupled resonator design that improves the spectral purity and laser operating efficiency.

    Lambda Physik, Fort Lauderdale, FL

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