• Ushio develops two lithographic lasers

    Ushio Inc. (Tokyo, Japan), a manufacturer of mercury arc lamps, power supplies, and illuminators for semiconductor lithographic systems, has developed two lasers for use as light sources for leading-edge wafer steppers. Both lasers emit at 193 nm, a wavelength seen as necessary for the production of next-generation semiconductor chips with linewidths of 0.15 µm and less. One source is an argon fluoride excimer laser that puts out line-narrowed light at an average power of 5 W. Its linewidth
    Nov. 1, 1998

    Ushio develops two lithographic lasers

    Ushio Inc. (Tokyo, Japan), a manufacturer of mercury arc lamps, power supplies, and illuminators for semiconductor lithographic systems, has developed two lasers for use as light sources for leading-edge wafer steppers. Both lasers emit at 193 nm, a wavelength seen as necessary for the production of next-generation semiconductor chips with linewidths of 0.15 µm and less. One source is an argon fluoride excimer laser that puts out line-narrowed light at an average power of 5 W. Its linewidth is 0.7 pm, while its repetition rate is 1 kHz. The other laser is an all-solid-state design and was developed jointly with an unnamed American laser manufacturer. Average power at 193 nm is 1 W at a 5-kH¥repetition rate, while spectral bandwidth is 0.1 pm.

    Sign up for Laser Focus World Newsletters
    Get the latest news and updates.

    Voice Your Opinion!

    To join the conversation, and become an exclusive member of Laser Focus World, create an account today!