February 21--Powerlase has announced a research collaboration with University College Dublin (UCD) that will further the development of Laser Produced Plasma (LPP) as an Extreme Ultraviolet (EUV) lithography light source.
The aim of the research is to provide the industry with a proven, robust, and cost effective laser product capable of providing a suitable light source for use in EUV lithography. Researchers from UCD will use vacuum equipment, which has been provided by Powerlase, to conduct a study of ion-emissions of the LPP EUV source. The LPP EUV approach reportedly is now the most promising technology for the high-volume manufacture of semiconductors at 32nm and below.
The latest development follows Powerlase' previously reported research collaborations in EUV lithography with the Extreme Ultravioltew Lithography Association in Japan and leading US academics at the University of Central Florida.
