Jena, Germany – The new JenLas disk IR50, from Jenoptik, for solar cell processing combines perfect beam quality in the infrared wavelength range at 1030 nm with a flexible tunable pulse length. This makes the 45-watt system ideal for the laser drilling of silicon wafers, which then allows the efficient production of back-contact solar cells. The electrical efficiency of the cells can be increased through the use of MWT or EWT (Metal Wrap Through and Emitter Wrap Through) technology.
In order to increase the active surface area of the cells, in the case of both technologies the contacts are laid from the front to the rear side of the cell. The contact fingers that are currently used as standard and cover parts of the active surface area can therefore be eliminated.
For additional information contact Jenoptik Lasers Material Processing (www.jenoptik.com)
[email protected].