Teem Photonics announces MicroChip and PowerChip sub-ns 266nm laser sources

Jan. 5, 2012
Teem Photonics S.A., Meylan, Cedex, France, has announced the release of two new deep UV sub-nanosecond 266nm laser sources.

Teem Photonics S.A., Meylan, Cedex, France, has announced the release of two new deep UV laser sources.

1) For applications ranging from material ablation to laser induced fluorescence, the 266nm MicroChip (above) range receives a significant enhancement with the new SNU-20F-000, increasing the average power from 2 mW to 12 mW and the pulse repetition rate from 6 kHz to 20 kHz. Multiple options such as photodiode synchronization or collimation help further adapting the product to the user's need.

2) For transparent material marking and micromachining, the PowerChip series (below) is now extended to 266 nm with the new PNU-M01510-000. Producing over 15 μJ with less than 350 ps pulse, this new laser achieves over 40kW of peak power.

Both lasers will benefit from the UV Long Life Process, a proprietary Teem Photonics process that brings deep UV lifetime to the same realm as the lifetime of the company's very rugged IR or green lasers.

Meet with the company at Photonics West, January 21 to 26, at booth #2211-H, French Pavilion, The Moscone Center, San Francisco.



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