Nanoimprint lithography process for high-volume manufacturing
St. Florian, Austria - EV Group (EVG) has introduced its SmartNIL large-area nanoimprint lithography (NIL) process. Available on all of the company's NIL platforms, the process provides a low-cost, large-area, and high-volume-manufacturing solution for a variety of advanced devices, including photonic-based devices such as LEDs, lasers, and photovoltaics; microarrays and nano-devices for medical devices and bioengineered applications; and advanced storage media, including newly emerging forms of non-volatile memory (NVM).
Features include a large full-field imprint area (up to 200mm), processing of >40 substrates/hr for 200mm substrates, and integrated soft stamp fabrication technology to reduce tool footprint and provide replication in less than 10 min. Self-cleaning properties reduce particle contamination and improve overall processing yields, while a room-temperature process avoids thermal mismatch and long-range structure distortion for improved alignment accuracy. Patterning on highly topographical structures is also possible.
For more information, please visit www.evgroup.com.
Industrial Laser Solutions Editors
We edited the content of this article, which was contributed by outside sources, to fit our style and substance requirements. (Editor’s Note: Industrial Laser Solutions has folded as a brand and is now part of Laser Focus World, effective in 2022.)