Cymer demonstrates 25W of avg. EUV power for 1.5 hours, completes facility

May 21, 2008
Cymer Inc., a supplier of light sources used in semiconductor lithography, announced this week at the Sematech EUV Source Workshop in New York that it has reached a milestone 25W of average extreme ultraviolet (EUV) power continuously for 1.5 hours, and is on track to achieve the 100W of average power needed for the first-scheduled delivery of production-ready EUV lithography tools in 2009.

Cymer Inc., a supplier of light sources used in semiconductor lithography, announced this week at the Sematech EUV Source Workshop in New York that it has reached a milestone 25W of average extreme ultraviolet (EUV) power continuously for 1.5 hours, and is on track to achieve the 100W of average power needed for the first-scheduled delivery of production-ready EUV lithography tools in 2009.

Additionally, Cymer announced the completion of its EUV manufacturing facility located in San Diego. The first pilot EUV sources are currently being assembled and tested in this new facility.

"Just three months after achieving 35W of EUV power for a short burst, Cymer has made significant progress in reaching 25W of average EUV power for more than one hour," said Ed Brown, president and COO for Cymer. "This power and duration achievement paired with the completion of our EUV manufacturing facility reflects Cymer's commitment to EUV and the commercialization of future lithography tools."

For more information, go to Cymer web site.

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