Photonics Industries develops high intensity sub ns SN series lasers for micromachining
Oct. 26, 2011
Photonics Industries International, Bohemia, N.Y., has developed the high intensity sub-ns SN series lasers for industrial micro machining applications. There is a desire to use shorter (i.e., sub ns) pulse width lasers to enable a more precise ablative based material processing. If the pulse width is too long >10 ns, the processing is fast, but crude. If the pulse width is too short <10ps, the processing is precise, but slow. In an effort to balance the optimum pulse width with material removal rate, Photonics Industries developed a unique sub ns (<1ns nominal pulse width) laser. Combining this with an excellent TEM00 mode quality (M2 <1.5) Photonics Industries announces a unique high intensity (i.e., high brightness) sub ns laser (the SN series) for industrial micro machining apps. These efficient lasers prove in for next generation applications such as: tempered glass, sapphire, or ceramics cutting, scribing and drilling, crystalline Si or thin film based solar cell processing, low K wafers and LED substrates scribing and dicing, via hole drilling/flex circuit cutting, ITO patterning/FPD processing, and other novel micromachining applications. Photonics Industries has several standard SN Series laser available: up to 40W @ 1064nm; up to 25W @ 532nm; and up to 14W @ 355nm all with <1ns nominal pulse widths, M2 <1.5 at high repetition rate (up to 80kHz). Photonics Industries also offers a high power UV ns (30W of UV), as well as high power green (50W at 532nm) and deep UV (263 and 266nm) lasers.
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