Lithography light source manufacturer Gigaphoton (Oyama, Japan) has achieved 24-hour continuous operation of its extreme ultraviolet (EUV) light source with average output power of 60W on its prototype laser-produced plasma (LPP) light sources, using operating patterns that simulate usage in an high-volume manufacturing (HVM) environment.
This achievement was a result of further advancements in key technologies developed by the company, such as Droplet Generators capable of producing tin (Sn) droplets smaller than 20 μm in diameter, the short-wavelength, solid-state pre-pulse laser and main pulse CO2 laser, and debris mitigation technology using high-output superconducting magnets and Sn etching. The company is planning to start operation of a high-output pilot unit by the end of 2015, and remains committed to furthering its R&D efforts with goals of achieving continuous operation at 250 W output levels, which is considered as a requirement for manufacturing applications such as memory devices.
Hitoshi Tomaru, Gigaphoton's president and CEO, believes that the achievement will also further encourage the industry to employ EUV scanners for their next-generation lithography processes.
This milestone was achieved as part of a program subsidized by the New Energy and Industrial Technology Development Organization (NEDO).
For more information, please visit www.gigaphoton.com.