UV symposium focuses on 157 nm

Nov. 15, 1999
The Second International UV Laser Symposium, held Oct. 13-14, 1999, by Lambda Physik (Fort Lauderdale, FL), attracted 90 attendees and concentrated on applications of the 157-nm-emitting fluorine excimer laser.

The Second International UV Laser Symposium, held Oct. 13-14, 1999, by Lambda Physik (Fort Lauderdale, FL), attracted 90 attendees and concentrated on applications of the 157-nm-emitting fluorine excimer laser. Attending industry experts included lithography researcher Mordechai Rothschild (Massachusetts Institute of Technology; Cambridge, MA) and Rich Harbison (Sematech; Austin, TX). About one-third of the talks were related to optical lithography, with the remainder divided between materials-processing and scientific applications, according to Mike Scaggs, director of customer support at Lambda Physik. The highlight of the symposium, says Scaggs, was that "157-nm technology has advanced so much in a year."

About the Author

John Wallace | Senior Technical Editor (1998-2022)

John Wallace was with Laser Focus World for nearly 25 years, retiring in late June 2022. He obtained a bachelor's degree in mechanical engineering and physics at Rutgers University and a master's in optical engineering at the University of Rochester. Before becoming an editor, John worked as an engineer at RCA, Exxon, Eastman Kodak, and GCA Corporation.

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