Craic Technologies spectrophotometer tests lasers, LEDs

March 28, 2006
March 28, 2006, San Dimas, CA--Craic Technologies has introduced a UV-visible-NIR microspectrophotometer for laser and light-source development. The instrument is designed for nondestructive spectroscopic analysis on the microscopic scale including film thickness measurement and the measurement of emission.

March 28, 2006, San Dimas, CA--Craic Technologies has introduced a UV-visible-NIR microspectrophotometer for laser and light-source development. The instrument is designed for nondestructive spectroscopic analysis on the microscopic scale including film thickness measurement and the measurement of emission.

The QDI 2010 microspectrophotometer is capable of measuring UV-visible-NIR range spectra of sample areas as small as a micron in size by transmission, reflectance, and light emission. The instrument is a significant advance in the analytical capabilities for the laser and LED industries, according to the company.

The instrument directly quantifies the emissions from microscopic lasers (such as semiconductor lasers) and light-emitting diodes. Additionally, the same instrument can be used to measure the thickness of films deposited on optics and wafers. This instrument is being used to develop the next generation of organic light-emitting diodes and other types of light sources. Claimed to be high-performance, durable, and easy to use, the QDI 2010 acquires UV-visible-NIR range spectra in as little as a millisecond with long-term stability and low noise resulting from its cooled scientific-grade CCD-array detector. It also incorporates high-resolution digital imaging, automation features, and sophisticated analytical software. Options include NIST-traceable standards.

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