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ArF lithography plays a critical role in the mass production of advanced semiconductors. Stable laser operation and the effective use of rare gas resources are key challenges for semiconductor manufacturers.
In recent years, the supply-demand balance of neon gas has become increasingly volatile due to geopolitical risks and global supply chain disruptions. Gigaphoton has supported customers in maintaining stable production through gas reduction technologies and gas recycling systems for KrF excimer lasers. The newly announced hTGM for ArF extends these efforts to the field of ArF lithography.
hTGM for ArF collects and recycles used gas within semiconductor fabs. A single hTGM for ArF unit is capable of reducing gas consumption by up to 470 kiloliters per year and can be connected to up to five ArF lasers. In addition, its hardware commonality with hTGM for KrF facilitates efficient production ramp.
Tatsuo Enami, President and CEO of Gigaphoton, said, “By combining technologies that reduce gas consumption in excimer lasers with on-site gas recycling systems, Gigaphoton aims to mitigate risks associated with the procurement of rare gases, support customers’ stable operations, and strengthen the supply chain resilience of the semiconductor industry. Gigaphoton will continue to contribute to the development of the global semiconductor industry through advanced laser technologies and environmentally conscious solutions.”
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