Designs and manufactures thin-film deposition systems of the industry standard for optics, optoelectronics and semiconductor applications at its facility in Switzerland.
Flexible cluster platform for sputter, PECVD, RIE, ICP etch, RTP. Configured with single and batch process modules according to process and throughput. Complete processes for ...
Dedicated sputter system for high volume production of precision optics coatings. Coating area up to 1.5 sq m, substrate sizes up to 310mm X 560mm. Outstanding repeatabilities...
Flexible batch evaporator for deposition and etch. Platform sizes 0.5 to 1.4m as standard. Custom solutions for "long throw", load locks and robot loading. Complete process solutions...
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