Manufactures magnetron sputtering sources enabling ion-assisted reactive sputtering that operate at low-mid 10-4 torr allowing simultaneous use of broad beam ion sources without arcing. Also power supplies and gas controllers.
Polaris™ GEN II research sputtering sources provide industrial robustness and performance in a small package. Available with a wide variety of options, including tilt, adjustable...
SunSource™ sputtering sources feature the Kamlok™ fast target exchange system, high target utiliization, stable, repeatable operation from low to high power levels, low 10-4 torr...
Ion™ 1500 DC power supply is software based - provides superior arc detection (≤100 nsecs) and suppression. Stable and repeatable at low power levels. Full range of features.
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