Throughput Decoupling: Multi-Mirror Array High-NA Objectives for Sub-3nm Metrology

March 17, 2026

1. The Stochastic Barrier: Resolution vs. Throughput

In the <3nm regime, the primary bottleneck in defect metrology is no longer just the diffraction limit, but the signal-to-noise ratio (SNR) at high scan speeds. Traditional single-channel inspection forces a compromise between sensitivity and TACT (Total Actual Cycle Time).

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