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Vistec’s VSB platforms provide a cost-effective, flexible e-beam lithography solution that maintains high resolution and pattern fidelity while supporting a broader range of applications, particularly in high-mix/low-volume production environments. The company’s platforms also support 300-mm wafer writing, positioning them for both advanced research and industrial manufacturing. Another key differentiator is Vistec’s proprietary ePLACE data preparation software, which streamlines data processing workflows and optimizes exposure strategies, including Cell Projection, for its VSB systems.
New Customer Engagements and Milestones
In Japan, Vistec recently completed the installation of an SB255 VSB system in the Takeda Sentanchi Super Cleanroom at The University of Tokyo (UTokyo) as part of the Advanced Research Infrastructure for Materials and Nanotechnology - Semiconductor Technology Infrastructure Initiative (ARIM-SETI). The Takeda Sentanchi Super Cleanroom is operated by Platform Device Research Division, Systems Design Lab (d.lab), Graduate School of Engineering, UTokyo. A high-resolution, universal and cost-effective tool supporting both direct write and mask making applications, the Vistec SB255 enables UTokyo to gain broader access to advanced applications. In addition, this installation represents a significant step in growing Vistec’s presence in the strategically important Japanese market. UTokyo partners with both Vistec, a member of the HEIDENHAIN Corporate Group, and HEIDENHAIN K.K. (Japan) as key industry suppliers to support precision research, materials science, and semiconductor lithography education.
In addition, Vistec has seen strong adoption across compound semiconductor foundries, with a double-digit number of system installations supporting advanced device manufacturing. In the United States, Vistec will supply an e-beam lithography system to a major technology innovator for an advanced research project, further highlighting the expanding role of e-beam technology in next-generation device innovation. Additional customer engagements in Europe further reflect growing demand for flexible, high-resolution lithography solutions.
In Taiwan, Vistec has maintained a strong regional presence for more than 20 years, supported by its local subsidiary, Vistec Electron Technology Co. Ltd., which provides dedicated field service engineering support to customers throughout the region. The company also works closely with its sales representative, Scientech Corporation, to support customer engagement and business development across the Taiwanese market. Vistec continues to expand its footprint with the ongoing installation of a 300-mm e-beam lithography system at the Taiwan Semiconductor Research Institute (TSRI), operating under the National Institutes of Applied Research (NIAR), following the successful installation of a 200-mm system last year. Vistec also serves customers in Taiwan’s compound semiconductor foundry market.
“With a heritage spanning more than 60 years, we continue to build on our reputation as an e-beam expert, delivering solutions that bridge advanced research and industrial-scale applications,” said Matthias Slodowski, General Manager at Vistec Electron Beam GmbH. “Driven by increasing demand for photonics, advanced semiconductor devices, and specialized manufacturing processes, the need for flexible, high-precision lithography solutions continues to grow. Our world-class VSB lithography platforms with seamless integrated Cell Projection technology provide the enhanced throughput, precision, flexibility, high automation and manufacturing efficiency to meet these needs. Today, e-beam technology is a critical enabler of future innovation for tomorrow’s advanced devices, and we are excited to showcase our latest technology advancements and application expertise at EMLC 2026.”
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