October 16, 2006, Pocatello, ID and Portland, OR--AMI Semiconductor and FLIR Systems today announced an agreement for high volume manufacturing of uncooled microbolometer infrared detectors.
Under the agreement, FLIR will install its proprietary microbolometer detector process at AMI Semiconductor's Class 1, eight-inch fabrication facility. The agreement will expand current microbolometer detector manufacturing capability and will also provide an opportunity to improve sensor yield by installing the process in a Class 1 fabrication facility.
"We are pleased to expand on our already successful partnership with AMIS," said Earl R. Lewis, president, CEO and chairman of FLIR Systems. "AMIS has supplied the CMOS read-out integrated circuit (ROIC) portion of our detectors for several years. This relationship, coupled with AMI Semiconductor's expertise in custom process installations and Class 1 fabrication, makes them the logical and obvious choice as our high volume microbolometer manufacturing partner."
