Nuclear-fusion research is key to new EUV lithography approach

August 19, 2009--Researchers at Purdue University (West Lafayette, IN) are adapting methods used in fusion-energy research to create extremely thin plasma beams for a new class of nanolithography that may be used to fabricate future computer chips.

August 19, 2009--Researchers at Purdue University (West Lafayette, IN) are adapting methods used in fusion-energy research to create extremely thin plasma beams for a new class of nanolithography that may be used to fabricate future computer chips.

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